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This is the first time I've heard of a 250W 19nm laser. That's a huge step forward.

The article mentions 13.5nm. Is 19nm the wavelength used to blast the tin that re-emits as the the 13.5nm EUV source? Is that where the power is going to result in a few watts at the printing surface?

First question, no, they use CO2 lasers which emit in the um range, not nm. Probably a typo.

Second question, the loss of power is due to two factors: 1) Conversion efficiency of CO2 laser pulse to EUV light pulse. This is in the single digit range as a percentage. 2) Transmission loss of EUV from light source to wafer. EUV mirrors reflect in the ballpark of 50% of the light, and there are many of them inside the scanner, so you have .5 * .5 * .5...

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