Generally speaking yes! That's what companies do that create masks for lithography so that the structures the manufacturers can create are smaller than the wavelength they use in the process. (See https://en.m.wikipedia.org/wiki/Computational_lithography). The article states that generally this is rather computationally expensive and I would wager that an analogous concept would be too. Perhaps a Neural Network could be trained to infer corrections and maybe that would be feasible then but maybe someone else with more experience in the field can elaborate on that.