My (incomplete) understanding is that current lithography relies heavily on multipatterning, which takes a long time. With EUV, you can have very small features with fewer lithography steps which improves factory throughput.

That's more of an economic benefit for chip manufacturers than a tangible benefit for a user of the end product, but it means being able to buy cheaper chips with more gates (in addition to any power or performance improvements that can still be had these days).