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Could diffractive optics be a decent alternative to reflective optics for EUV lithography? It has the same advantage of not needing a refractive material that works with EUV, but you can stick with optics that are 'inline'.

I guess the exposure just isn't going to be strong-enough because the actual aperture is just to small?

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You still need a solid material which is transparent to EUV to build your lens onto - and isn't the lack of such a material the main reason why refractive EUV lenses aren't a thing?

A diffractive lens works by having small holes in a plate, at least as I understand it. The diffractive pattern then interferes constructively at the focal point. So the transparent material is just 'air' or more likely, vacuum. It doesn't need to be solid.

The problem I forsee is that it doesn't let much light through. Because most of the lens isn't holes, but instead solid non transparent material.

Do we possess the technology to place atoms sufficiently close enough to direct euv? Considering the fact euv is already close to the limit of our abilities

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