Yes, I think it's accurate. As the article says, the #1 problem with EUV is low power output. Especially with less sensitive photoresists (another problem unmentioned), today's 30 W output is not enough to churn out 100-200 wafers per hour.
By the way, an interesting alternative to blasting drops of molten tin in vacuum is to just build a multimillion dollar synchrotron and use its x-rays for lithography in a fab. This has a whole bunch of other problems, but it's an idea that engineers are seriously considering.
Most of my knowledge comes from my friend who used to work on the problem of inspecting x-ray masks.